Searle Cleanroom and Nanofabrication Facility

Etching/ Deposition Room

AJA UHV Sputtering System/ AJA Ebeam Evaporator/ Oxford ICP/ O2 plasma Etch/ Arradiance ALD System

Lithography Room

EVG 620 Mask Aligner/ Laurell Spin-coater/ Detak Profilometer

About us

The Searle Cleanroom is a shared user facility open to all members of the UChicago research community. It houses a variety of lithography, deposition, and device characterization tools in a Class 100/1000 environment. Adjacent to the cleanroom are laboratories for preparing and characterizing biological samples and for soft lithography.

Our research staff is available to assist users with training, process development, and experiment design. Inquiries from non-university users are welcome.